Flexible Electronics News

Flash Lamp Annealing: Energy-effective Process for Efficient Annealing of Large-area Substrates

In cooperation with ROVAK GmbH, Fraunhofer FEP will study and further develop the Flash Lamp Annealing for large-area applications.

Author Image

By: Anthony Locicero

Copy editor, New York Post

In thin-film technology, heat treatment – also referred to as annealing – is often used to selectively improve material properties of thin films, such as their crystallinity or density, and hence their electrical and optical properties. However, these are energy-intensive as well as time-intensive techniques, associated with large facility footprints. That makes their applicability for large-area substrate formats difficult or even impossible. Flash lamp annealing (FLA) offers a smart solution...

Continue reading this story and get 24/7 access to Ink World magazine for FREE


Already a subscriber? Sign in

Keep Up With Our Content. Subscribe To Ink World magazine Newsletters